Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium. IACR Transactions on Cryptographic Hardware and Embedded Systems, [S. l.], v. 2024, n. 4, p. 335–354, 2024. DOI: 10.46586/tches.v2024.i4.335-354. Disponível em: https://ojs.ub.rub.de/index.php/TCHES/article/view/11795.. Acesso em: 21 nov. 2024.